XPS / HAXPES Scanning Microprobe
The new PHI Quantes is an XPS scanning microprobe for both:
- Traditional (soft) XPS using an Al Kα X-ray source.
- Extended depth of analysis experiments using a Cr Kα (hard) X-ray source – also known as HAXPES (Hard X-ray Photoelectron Spectroscopy).
Analyse both small areas of interest and large, uniform surface areas. The X-ray sources can be switched automatically, so you can analyse the same area or points of your sample.
The Quantes is based on established technology from the PHI Quantera II, with automatic analysis, automatic sample transfer, turnkey charge neutralisation and advanced data processing.
- Patented XPS/HAXPES scanning microprobe technology
- In-situ analysis using soft (XPS) and hard (HAXPES) X-rays
- 3 times greater analysis depth with Cr X-rays compared to Al X-rays
- Acess higher energy core photoelectron peaks with Cr X-rays
- Patented dual beam charge neutralisation for insulator analysis
- High performance spectroscopy and sputter depth profiling
- Fully integrated, high throughput surface analysis
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Dual Scanning Monochromatic X-ray Source
The dual scanning X-ray source consists of the monochromatic Cr Kα (5.4 keV) and Al Kα (1.5 keV). Generate secondary electron images (SXI) by scanning the X-ray beam over the sample. This is useful for identifying areas and points for further analysis.
The X-ray anode position and the motorised mechanical shutter are software-controlled, so you can switch easily between beam sources. No manual adjustment is required, so you can measure exactly the same point easily with both Cr Kα and Al Kα.
Turnkey Charge Neutralisation
Physical Electronics’ patented turnkey charge neutralisation automatically compensates for charge on the sample surface. This is the same technology as on PHI’s other XS systems, and can be used even with Cr Kα.
Fully-automated analysis routines can be programmed easily. Up to three samples can be positioned in the chamber for automated analysis. Even insulating samples can be analysed in fully-automated mode, with the state-of-the-art turnkey charge neutralisation technique.
The example below illustrates the data you can acquire from a Si substrate through PMMA films of various thicknesses, measured using the Al Kα and Cr Kα. The information depth with Cr Kα is about three times larger than Al Kα.
Qualitative and Quantitative Analysis with Cr Kα
Data from the Cr Kα source can be processed using the same method as with conventional XPS, with PHI MultiPak analysis software.
MultiPak includes a database of photoelectron peak positions (PeakID) and relative sensitivity factors (RSF) of elements compatible with Cr Kα. The RSF database for Cr Kα can be used for quantitative evaluations as well as Al Kα.
Spectra taken by both Al Kα and Cr Kα can be processed simultaneously in MultiPak. You can compare them easily, and process results together as you need to.