Select your region: UK & Ireland   /   Nordic

PHI Quantes

Physical Electronics (PHI)

PHI Quantes

XPS / HAXPES Scanning Microprobe

The new PHI Quantes is an XPS scanning microprobe for both:

  • Traditional (soft) XPS using an Al Kα X-ray source.
  • Extended depth of analysis experiments using a Cr Kα (hard) X-ray source – also known as HAXPES (Hard X-ray Photoelectron Spectroscopy).

Analyse both small areas of interest and large, uniform surface areas. The X-ray sources can be switched automatically, so you can analyse the same area or points of your sample.

The Quantes is based on established technology from the PHI Quantera II, with automatic analysis, automatic sample transfer, turnkey charge neutralisation and advanced data processing.

  • Patented XPS/HAXPES scanning microprobe technology
  • In-situ analysis using soft (XPS) and hard (HAXPES) X-rays
  • 3 times greater analysis depth with Cr X-rays compared to Al X-rays
  • Acess higher energy core photoelectron peaks with Cr X-rays
  • Patented dual beam charge neutralisation for insulator analysis
  • High performance spectroscopy and sputter depth profiling
  • Fully integrated, high throughput surface analysis

Contact us for more information and quotes:
01223 422 269 or

PHI Quantes



  • Large and micro area spectroscopy
  • Organic and inorganic depth profiling
  • Secondary electron and XPS imaging
  • Insulating or conductive samples


  • Both XPS and HAXPES (soft and hard X-ray)
  • Automatic switching between X-ray sources – measure the same point easily
  • Greater information depth with Cr Kα

Dual Scanning Monochromatic X-ray Source

The dual scanning X-ray source consists of the monochromatic Cr Kα (5.4 keV) and Al Kα (1.5 keV). Generate secondary electron images (SXI) by scanning the X-ray beam over the sample. This is useful for identifying areas and points for further analysis.

The X-ray anode position and the motorised mechanical shutter are software-controlled, so you can switch easily between beam sources.  No manual adjustment is required, so you can measure exactly the same point easily with both Cr Kα and Al Kα.

PHI Quantes SXI Images

SXI images with dual beam

Turnkey Charge Neutralisation

Physical Electronics’ patented turnkey charge neutralisation automatically compensates for charge on the sample surface. This is the same technology as on PHI’s other XS systems, and can be used even with Cr Kα.

Turnkey Charge Neutralisation

Turnkey charge neutralisation

Automated Analysis

Fully-automated analysis routines can be programmed easily. Up to three samples can be positioned in the chamber for automated analysis. Even insulating samples can be analysed in fully-automated mode, with the state-of-the-art turnkey charge neutralisation technique.

Information Depth

The example below illustrates the data you can acquire from a Si substrate through PMMA films of various thicknesses, measured using the Al Kα and Cr Kα. The information depth with Cr Kα is about three times larger than Al Kα.

Information depth

Si 2p spectrum from Si substrate detected through PMMA

Qualitative and Quantitative Analysis with Cr Kα

Data from the Cr Kα source can be processed using the same method as with conventional XPS, with PHI MultiPak analysis software.

MultiPak includes a database of photoelectron peak positions (PeakID) and relative sensitivity factors (RSF) of elements compatible with Cr Kα. The RSF database for Cr Kα can be used for quantitative evaluations as well as Al Kα.

Spectra taken by both Al Kα and Cr Kα can be processed simultaneously in MultiPak. You can compare them easily, and process results together as you need to.

PHI Multipak Software

Data analysis with PHI MultiPak

Back to Top